DRAM Dry Etch Pathfinding Intern Process Innovation

Micron Technology in Boise, Idaho is seeking a DRAM Dry Etch Process Pathfinding Intern to contribute to advanced plasma etch research for next‐generation memory products. You will work with experienced engineers, gain hands-on experience with dry etch equipment, and support data‐driven problem solving in a fast‐ paced lab environment. You will apply analytical methods, document results, and collaborate across teams while learning about vacuum systems, RF/plasma science, and semiconductor